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Heterojunction Diodes Comprising p-Type Ultrananocrystalline Diamond Films Prepared by Coaxial Arc Plasma Deposition and n-Type Silicon Substrates
Journal article   Peer reviewed

Heterojunction Diodes Comprising p-Type Ultrananocrystalline Diamond Films Prepared by Coaxial Arc Plasma Deposition and n-Type Silicon Substrates

Yūki Katamune, Shinya Ohmagari, Sausan Al-Riyami, Seishi Takagi, Mahmoud Shaban and Tsuyoshi Yoshitake
Jpn J Appl Phys, Vol.52(6), pp.065801-065801-5
06/2013

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