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Hole transport in SiO2 and reoxidized nitrided SiO2 gate insulators at low temperature
Journal article   Peer reviewed

Hole transport in SiO2 and reoxidized nitrided SiO2 gate insulators at low temperature

H E Boesch and GREGORYJ Dunn
IEEE transactions on nuclear science, Vol.38(6), pp.1083-1088
01/12/1991

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