Abstract
The influences of gamma ray and thermal annealing on Zinc oxide and Titanium oxide thin films characteristics have been investigated. The morphology was examined by Atomic Force Microscopy (AFM) for surface roughness and grain sizes. Optical properties such as transmission and absorption of the deposited films were investigated in the visible region, using a spectrophotometer. Energy band gap (Eg) was calculated in the visible wavelength (380-780 nm) of the as-deposited and annealed films. Irradiation of the films was performed with low gamma doses to examine their stability during their uses as protective coatings or as anodes in optoelectronic devices. It was found that the optical band gap values were slightly decreased as the radiation dose was increased. The two oxide films were annealed in air atmosphere at 350 degrees C for one hour and examined for the change in optical or morphological properties if any. We represent a comparative study between the physical and spectral properties of Zinc and titanium oxides prepared by a well-known physical deposition process to investigate the possibility of their uses in optoelectronic devices such as anode for organic solar cells and light emitting diodes. Even after being exposed to low gamma irradiation doses and then thermally annealed the ZnO and TiO2 films maintained good optical, electrical and morphological properties. This made them very favorable to be used as anodes for solar cells, light emitting diodes and as protective coatings in space windows.