INTERFACIAL MICROSTRUCTURE OF HIGH-κ DIELECTRIC CaZrO x FILMS DEPOSITED BY PULSE LASER DEPOSITION IN LOW OXYGEN PRESSURE

Journal article

Peer reviewed

X. Y. Qiu, H. W. Liu, F. Fang, M. J. HA and J. -M. Liu

Integrated ferroelectrics, Vol.74(1), pp.103-111

09/2005

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Title: INTERFACIAL MICROSTRUCTURE OF HIGH-κ DIELECTRIC CaZrO x FILMS DEPOSITED BY PULSE LASER DEPOSITION IN LOW OXYGEN PRESSURE
Creators - without role: X. Y. Qiu - Collaborative Innovation Center of Advanced Microstructures
H. W. Liu - Collaborative Innovation Center of Advanced Microstructures
F. Fang - Collaborative Innovation Center of Advanced Microstructures
M. J. HA - Collaborative Innovation Center of Advanced Microstructures
J. -M. Liu - International Centre for Materials Physics
Publication Details: Integrated ferroelectrics, Vol.74(1), pp.103-111
Identifiers: 9945159708331
Academic Unit: King Abdullah University of Science & Technology
Language: English
Resource Type: Journal article