Abstract
This paper presents some investigations of the effect of nanopatterning on the properties of aluminum layer deposited by sputtering. UV-Nanoimprint Lithography technique has been used for the realization of a 2D array of nanostructures (pillars) in aluminum film characterized by cylindrical shape and the following structural parameters: diameter between 400 nm and 490 nm, depth between 320 nm and 420 nm and periodicity of 1.1 mu m, which have been revealed by SEM and AFM measurements. The UV-Vis transmission, reflection and photoluminescence measurements have evidenced the effect of the nanopatterning on the optical properties of the A1 layer.