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Impact of Oxygen Plasma Treatment on the Device Performance of Zinc Oxide Nanoparticle-Based Thin-Film Transistors
Journal article   Peer reviewed

Impact of Oxygen Plasma Treatment on the Device Performance of Zinc Oxide Nanoparticle-Based Thin-Film Transistors

Hendrik Faber, Johannes Hirschmann, Martin Klaumuenzer, Bjoern Braunschweig, Wolfgang Peukert and Marcus Halik
ACS applied materials & interfaces, Vol.4(3), pp.1693-1696
28/03/2012
PMID: 22391057

Abstract

Materials Science Materials Science, Multidisciplinary Nanoscience & Nanotechnology Science & Technology Science & Technology - Other Topics Technology

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