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In-situ atomic force microscopic study of reverse pulse plated Cu/Co-Ni-Cu films
Journal article   Peer reviewed

In-situ atomic force microscopic study of reverse pulse plated Cu/Co-Ni-Cu films

D Gupta, A. C Nayak, J Mazher, R Sengar, K. P Joshi and R. K Pandey
Journal of materials science, Vol.39(5), pp.1615-1620
01/03/2004

Abstract

Applied sciences Condensed matter: structure, mechanical and thermal properties Cross-disciplinary physics: materials science; rheology Electrodeposition, electroplating Exact sciences and technology Low-dimensional structures (superlattices, quantum well structures, multilayers): structure, and nonelectronic properties Materials science Metals. Metallurgy Methods of deposition of films and coatings; film growth and epitaxy Physics Solid surfaces and solid-solid interfaces Structure and morphology; thickness Surface structure and topography Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) Thin film structure and morphology

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