Influence of Ge addition on the morphology and properties of TiN thin films deposited by magnetron sputtering

Journal article

Peer reviewed

C. S Sandu, R Sanjines, M Benkahoul, M PARLINSKA-WOJTAN, A Karimi and F Levy

Thin solid films, Vol.496(2), pp.336-341

21/02/2006

Abstract

Cross-disciplinary physics: materials science; rheology

Deposition by sputtering

Exact sciences and technology

Materials science

Methods of deposition of films and coatings; film growth and epitaxy

Physics

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Title: Influence of Ge addition on the morphology and properties of TiN thin films deposited by magnetron sputtering
Creators - without role: C. S Sandu - École Polytechnique Fédérale de Lausanne
R Sanjines - École Polytechnique Fédérale de Lausanne
M Benkahoul - École Polytechnique Fédérale de Lausanne
M PARLINSKA-WOJTAN - École Polytechnique Fédérale de Lausanne
A Karimi - École Polytechnique Fédérale de Lausanne
F Levy - École Polytechnique Fédérale de Lausanne
Publication Details: Thin solid films, Vol.496(2), pp.336-341
Publisher: Elsevier Science
Identifiers: 9930362008331
Academic Unit: Taibah University
Language: English
Resource Type: Journal article