Influence of high energy ion irradiation on structural, morphological and optical properties of high -k dielectric hafnium oxide (HfO 2 ) thin films by atomic layer deposition

Journal article

Peer reviewed

Rajesh Kumar, Vishnu Chauhan, N. Koratkar, Shalendra Kumar, Aditya Sharma, Keun-Hwa Chae and Sung Ok Won

Journal of alloys and compounds, Vol.831

05/08/2020

Abstract

Chemistry

Chemistry, Physical

Materials Science

Materials Science, Multidisciplinary

Metallurgy & Metallurgical Engineering

Physical Sciences

Science & Technology

Technology

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Title: Influence of high energy ion irradiation on structural, morphological and optical properties of high -k dielectric hafnium oxide (HfO 2 ) thin films by atomic layer deposition
Creators - without role: Rajesh Kumar - Guru Gobind Singh Indraprastha University
Vishnu Chauhan - Guru Gobind Singh Indraprastha University
N. Koratkar - Rensselaer Polytech Inst, Dept Mech Aerosp & Nucl Engn, Troy, NY 12180 USA
Shalendra Kumar - King Faisal University
Aditya Sharma - Manav Rachna Univ, Dept Phys, Faridabad 121004, Haryana, India
Keun-Hwa Chae - Korea Inst Sci & Technol, Adv Anal Ctr, Seoul 02792, South Korea
Sung Ok Won - Korea Inst Sci & Technol, Adv Anal Ctr, Seoul 02792, South Korea
Publication Details: Journal of alloys and compounds, Vol.831
Publisher: Elsevier
Number of pages: 15
Grant note: University Grant Commission (UGC), Govt. of India, New Delhi, India IUAC/XIII.3A/59319 / Inter University Accelerator Centre (IUAC), New Delhi, India GGSIPU/DRC/FRGS/2019/1553/15 / FRGS Project
Identifiers: 9919762808331
Academic Unit: King Faisal University
Language: English
Resource Type: Journal article