Influence of substrate bombardment on sputtered a-Si:N thin film properties

Journal article

Peer reviewed

A Attaf, M. L Benkhedir and M. S Aida

Physica. B, Condensed matter, Vol.355(1-4), pp.270-279

01/01/2005

Abstract

Amorphous semiconductors; glasses

Condensed matter: electronic structure, electrical, magnetic, and optical properties

Cross-disciplinary physics: materials science; rheology

Deposition by sputtering

Electrical properties of specific thin films

Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures

Exact sciences and technology

Materials science

Methods of deposition of films and coatings; film growth and epitaxy

Physics

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Title: Influence of substrate bombardment on sputtered a-Si:N thin film properties
Creators - without role: A Attaf - Université Constantine 2
M. L Benkhedir - Université Constantine 2
M. S Aida - Université Constantine 2
Publication Details: Physica. B, Condensed matter, Vol.355(1-4), pp.270-279
Publisher: Elsevier
Identifiers: 9938346608331
Academic Unit: King Abdulaziz University
Language: English
Resource Type: Journal article