Integration process for photonic integrated circuits using plasma damage induced layer intermixing

Journal article

Peer reviewed

B. S Ooi, A. C Bryce and J. H Marsh

Electronics letters, Vol.31(6), pp.449-451

16/03/1995

Abstract

Applied sciences

Electronics

Exact sciences and technology

Microelectronic fabrication (materials and surfaces technology)

Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices

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Title: Integration process for photonic integrated circuits using plasma damage induced layer intermixing
Creators - without role: B. S Ooi - University of Glasgow
A. C Bryce - University of Glasgow
J. H Marsh - University of Glasgow
Publication Details: Electronics letters, Vol.31(6), pp.449-451
Publisher: Institution of Electrical Engineers
Identifiers: 9945584208331
Academic Unit: King Abdullah University of Science & Technology
Language: English
Resource Type: Journal article