Sign in
Interface analysis of Si-Al-O-N materials by a 300kV FE-TEM
Journal article   Peer reviewed

Interface analysis of Si-Al-O-N materials by a 300kV FE-TEM

F F Xu, C M Wang, Y Bando and M Mitomo
Microbeam analysis 2000 : proceedings of the Second Conference of the International Union of Microbeam Analysis Societies held in Kailua-Kona, Hawaii, 9-14 July 2000, (165), pp.163-164
INSTITUTE OF PHYSICS CONFERENCE SERIES
01/01/2000

Abstract

Instruments & Instrumentation Microscopy Physical Sciences Physics Physics, Multidisciplinary Science & Technology Spectroscopy Technology

Metrics

1 Record Views

Details