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Investigation of the p-GaN layer thickness of InGaN-based photoelectrodes for photoelectrochemical hydrogen generation
Journal article   Open access  Peer reviewed

Investigation of the p-GaN layer thickness of InGaN-based photoelectrodes for photoelectrochemical hydrogen generation

Daisuke Iida, Takamitsu Shimizu and Kazuhiro Ohkawa
JAPANESE JOURNAL OF APPLIED PHYSICS, Vol.58(SC), p.SCCC32
01/06/2019

Abstract

Physical Sciences Physics Physics, Applied Science & Technology
url
https://doi.org/10.7567/1347-4065/ab09d7View
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