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Magnetic reversal and thermal stability of CoFeB perpendicular magnetic tunnel junction arrays patterned by block copolymer lithography
Journal article   Peer reviewed

Magnetic reversal and thermal stability of CoFeB perpendicular magnetic tunnel junction arrays patterned by block copolymer lithography

Kun-Hua Tu, Eduardo Fernandez, Hamid Almasi, Weigang Wang, David Navas Otero, Konstantinos Ntetsikas, Dimitrios Moschovas, Apostolos Avgeropoulos and Caroline A Ross
Nanotechnology, Vol.29(27), pp.275302-275302
06/07/2018
PMID: 29633719

Abstract

magnetic tunnel junction nanolithography nanomagnetism

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