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Misfit Strain Relaxation by Stacking Fault Generation in InGaN Quantum Wells Grown on m-Plane GaN
Journal article   Peer reviewed

Misfit Strain Relaxation by Stacking Fault Generation in InGaN Quantum Wells Grown on m-Plane GaN

Alec M. Fischer, Zhihao Wu, Kewei Sun, Qiyuan Wei, Yu Huang, Ryota Senda, Daisuke Iida, Motoaki Iwaya, Hiroshi Amano and Fernando A. Ponce
Applied physics express, Vol.2(4), pp.0410021-0410023
01/04/2009

Abstract

Physical Sciences Physics Physics, Applied Science & Technology
InGaN quantum wells, grown on non-polar m-plane GaN and emitting light at 560 nm, experience lattice mismatch strain relaxation by the generation of stacking faults. Each stacking fault terminates a basal plane from the substrate side, generating misfit dislocations that have a Burgers vector with a 1/2[0001] component. The structural and optical properties of such thin film structures are reported. (c) 2009 The Japan Society of Applied Physics

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