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Modeling of Reaction Pathways of GaN Growth by Metalorganic Vapor-Phase Epitaxy Using TMGa/NH 3 /H 2 System: A Computational Fluid Dynamics Simulation Study
Journal article   Peer reviewed

Modeling of Reaction Pathways of GaN Growth by Metalorganic Vapor-Phase Epitaxy Using TMGa/NH 3 /H 2 System: A Computational Fluid Dynamics Simulation Study

Akira Hirako, Kazuhide Kusakabe and Kazuhiro Ohkawa
Japanese Journal of Applied Physics, Vol.44(2R), p.874
01/02/2005

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