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On triple dislocation nodes observed by TEM in a Ge0.4Si0.6 film grown on a slightly deviating (0 0 1)Si substrate
Journal article   Peer reviewed

On triple dislocation nodes observed by TEM in a Ge0.4Si0.6 film grown on a slightly deviating (0 0 1)Si substrate

S. Neily, S. Youssef, A. Gutakovskii and R. Bonnet
Philosophical magazine letters, Vol.91(8), pp.510-515
01/08/2011

Abstract

dislocation elastic field thin-film silicon transmission electron microscopy

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