Optimization of plasma-enhanced chemical vapor deposition silicon oxynitride layers for integrated optics applications

Journal article

Peer reviewed

M. G Hussein, K Worhoff, G Sengo and A Driessen

Thin solid films, Vol.515(7-8), pp.3779-3786

26/02/2007

Abstract

Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)

Condensed matter: electronic structure, electrical, magnetic, and optical properties

Cross-disciplinary physics: materials science; rheology

Exact sciences and technology

Materials science

Methods of deposition of films and coatings; film growth and epitaxy

Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation

Optical properties of specific thin films

Physics

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Title: Optimization of plasma-enhanced chemical vapor deposition silicon oxynitride layers for integrated optics applications
Creators - without role: M. G Hussein - University of Twente
K Worhoff - University of Twente
G Sengo - University of Twente
A Driessen - University of Twente
Publication Details: Thin solid films, Vol.515(7-8), pp.3779-3786
Publisher: Elsevier Science
Identifiers: 9910674608331
Academic Unit: Taif University
Language: English
Resource Type: Journal article