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Patterning, Characterization, and Chemical Sensing Applications of Graphene Nanoribbon Arrays Down to 5 nm Using Helium Ion Beam Lithography
Journal article   Peer reviewed

Patterning, Characterization, and Chemical Sensing Applications of Graphene Nanoribbon Arrays Down to 5 nm Using Helium Ion Beam Lithography

Ahmad N. Abbas, Gang Liu, Bilu Liu, Luyao Zhang, He Liu, Douglas Ohlberg, Wei Wu and Chongwu Zhou
ACS nano, Vol.8(2), pp.1538-1546
25/02/2014
PMID: 24467172

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