Abstract
The paper is concerned with an investigation of the effect of the mist-deposited downshifting nanocrystalline quantum dots (NQD) films both continuous and patterned on the performance of single-crystal commercial silicon solar cells. Different thicknesses of the NQD films are explored in an attempt to improve cell's efficiency in the ultraviolet (UV) range (below 400 nm) of the solar spectrum. The results obtained indicate that the maximum UV absorption is observed with a 50-nm-thick NQD film as reflected by on the average 45% increase in UV external quantum efficiency as compared with the solar cell without the NQD film. The patterned NQD films are showing improved performance in the visible range as compared with unpatterned NQD films without compromising the performance of the cell in the UV range of the solar spectrum. Also, an increase in power conversion efficiency by 12.5% is observed. Overall, an improvement of silicon solar cells performance using mist deposition of downshifting NQD films instead of spin-on coating as previously explored in other studies is demonstrated.