Photochemical generation and trapping of radicals from bisphenyl carbodiazone

Markus R. Heinrich; Marcel D. Kirschstein

doi:10.1016/j.tetlet.2006.01.128

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Photochemical generation and trapping of radicals from bisphenyl carbodiazone

Journal article

Peer reviewed

Photochemical generation and trapping of radicals from bisphenyl carbodiazone

Markus R. Heinrich and Marcel D. Kirschstein

Tetrahedron letters, Vol.47(13), pp.2115-2118

27/03/2006

DOI: https://doi.org/10.1016/j.tetlet.2006.01.128

Abstract

(Phenyldiazenyl)carbonyl radicals

Bisphenyl carbodiazone

Carbooxygenation

Phenyl radicals

UV irradiation at 350 nm of bisphenyl carbodiazone creates nitrogen, phenyl and (phenyldiazenyl)carbonyl radicals under mild conditions. The radicals formed were trapped by olefins and tetramethylpiperidinoxyl radicals.

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Title: Photochemical generation and trapping of radicals from bisphenyl carbodiazone
Creators - without role: Markus R. Heinrich - Technical University of Munich
Marcel D. Kirschstein - Technical University of Munich
Publication Details: Tetrahedron letters, Vol.47(13), pp.2115-2118
Publisher: Elsevier Ltd
Identifiers: 9938834408331
Academic Unit: King Abdulaziz University
Language: English
Resource Type: Journal article