Abstract
Thin films of pure cadmium have been deposited using electron beam evaporation technique. Effect of radio frequency (RF) plasma oxidation on structural, optical and electrical properties of cadmium thin films has been investigated. It was found that the RF plasma treatment affects on the physical properties of the oxidized cadmium films. Transmittance values of 87% in the visible region and 90% in the near infrared region have been obtained for cadmium oxide (CdO) film oxidized at a plasma-processing power of 600W. The optical energy gap, E-g, was found to increase as the RF plasma-processing power increases. The resistivity values of 3 x 10(-3) and 5 x 10(-3) (Omega cm) have been obtained for CdO films oxidized at RF plasma-processing powers of 550 and 600W respectively. (C) 2012 Elsevier B.V. All rights reserved.