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Resistive switching in reactive cosputtered MFe2O4 (M=Co, Ni) films
Journal article   Peer reviewed

Resistive switching in reactive cosputtered MFe2O4 (M=Co, Ni) films

C. Jin, D. X. Zheng, P. Li, W. B. Mi and H. L. Bai
Applied surface science, Vol.263, pp.678-681
15/12/2012

Abstract

Chemistry Chemistry, Physical Materials Science Materials Science, Coatings & Films Physical Sciences Physics Physics, Applied Physics, Condensed Matter Science & Technology Technology

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