Abstract
As the size of electronic devices continues to shrink, characterization methods capable of precisely probing localized properties become increasingly important. Scanning probe microscopy techniques can examine local phenomena, and conductive atomic force microscopy can, in particular, study local electromechanical properties. Such techniques have already played a valuable role in the development of nanoelectronics, but their capabilities remain relatively limited compared with the probe stations typically used to examine electronic devices. Here, we discuss the potential of conductive atomic force microscopy in nanoelectronics. We explore possible characterization strategies, enhanced electronics for the technique and improved multiprobe approaches. We also propose a multiprobe scanning probe microscopy system that combines different types of probes and could allow multiple nanofabrication and characterization experiments to be carried out simultaneously and under vacuum conditions.