Selective electrodeposition of Cu nanostructures on focused ion beam sensitized p-Si

Journal article

Peer reviewed

A Spiegel, L Staemmler, M Döbeli and P Schmuki

Journal of the Electrochemical Society, Vol.149(8), pp.C432-C437

01/08/2002

Abstract

Cross-disciplinary physics: materials science; rheology

Electrodeposition, electroplating

Exact sciences and technology

Materials science

Methods of deposition of films and coatings; film growth and epitaxy

Physics

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Title: Selective electrodeposition of Cu nanostructures on focused ion beam sensitized p-Si
Creators - without role: A Spiegel - École Polytechnique Fédérale de Lausanne
L Staemmler - Swiss Federal Institute of Technology Zurich, ETHZ, Institute of Materials Chemistry and Corrosion, 8093 Zurich, Switzerland
M Döbeli - ETH Zurich
P Schmuki - Friedrich-Alexander-Universität Erlangen-Nürnberg
Publication Details: Journal of the Electrochemical Society, Vol.149(8), pp.C432-C437
Publisher: Electrochemical Society
Identifiers: 9940542508331
Academic Unit: King Abdulaziz University
Language: English
Resource Type: Journal article