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Silicon protected with atomic layer deposited TiO2: durability studies of photocathodic H-2 evolution
Journal article   Peer reviewed

Silicon protected with atomic layer deposited TiO2: durability studies of photocathodic H-2 evolution

Brian Seger, David S. Tilley, Thomas Pedersen, Peter C. K. Vesborg, Ole Hansen, Michael Gratzel, Ib Chorkendorff and Mohammad K Nazeeruddin
RSC advances, Vol.3(48), pp.25902-25907
09/01/2014

Abstract

Chemistry Chemistry, Multidisciplinary Physical Sciences Science & Technology

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