Abstract
The photostability of poly(vinyl chloride), PVC, containing various Schiff base metal complexes (0.5% by weight) was investigated. Various indices corresponding to a number of functional groups were monitored with irradiation of polymeric films to determine their photostabilization activities. The quantum yield of the chain scission (Φcs) of modified polymeric films was found to be (1.15⁻4.65) × 10⁶. The surface morphology of a PVC sample was investigated by the use of atomic force microscope (AFM). The photostability of PVC films in the presence of Schiff base additives was found to follow the following order: PVC < PVC + CuL₂ < PVC + CdL₂ < PVC + ZnL₂ < PVC + SnL₂ < PVC + NiL₂. Various mechanisms for PVC films photostability containing the Schiff base additives have been suggested.