State-of-the-Art X-Ray Photoelectron Spectroscopy (XPS): Conventional and Synchrotron X-Ray Sources for Micro-XPS

E. L. Principe; R. W. Odom; A. L. Johnson; G. D. Ackermann; Z. Hussain; H. Padmore

doi:10.1557/PROC-524-221

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Journal article

State-of-the-Art X-Ray Photoelectron Spectroscopy (XPS): Conventional and Synchrotron X-Ray Sources for Micro-XPS

E. L. Principe, R. W. Odom, A. L. Johnson, G. D. Ackermann, Z. Hussain and H. Padmore

MRS proceedings, Vol.524, pp.221-226

01/01/1998

DOI: https://doi.org/10.1557/PROC-524-221

Abstract

This paper presents preliminary data on analyses of selected materials using two state-ofthe- art XPS systems: the Physical Electronics Inc. (PHI, Eden Prairie, MN) Quantum 2000 instrument and the microXPS beamline (7.3.2.1) at the Advanced Light Source (ALS). This research compares and contrasts relevant performance characteristics of the two systems including elemental and chemical state detection sensitivity, imaging capabilities including lateral resolution and useful image fields, role of X-ray dose damage to surface, analysis speed as well as analytical throughput.

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Title: State-of-the-Art X-Ray Photoelectron Spectroscopy (XPS): Conventional and Synchrotron X-Ray Sources for Micro-XPS
Creators - without role: E. L. Principe - Evans Analytical Group
R. W. Odom - Evans Analytical Group
A. L. Johnson - Lawrence Berkeley National Laboratory
G. D. Ackermann - Lawrence Berkeley National Laboratory
Z. Hussain - Lawrence Berkeley National Laboratory
H. Padmore - Lawrence Berkeley National Laboratory
Contributors - without role: S.M. Mini
D.L. Perry
S.R. Stock
L.J. Terminello
Publication Details: MRS proceedings, Vol.524, pp.221-226
Publisher: Cambridge University Press
Number of pages: 6
Identifiers: 9952680208331
Academic Unit: King Saud University
Language: English
Resource Type: Journal article