Abstract
Multilayer (3, 5 and 7 layers) 1% Copper (Cu) doped Titanium dioxide (TiO2) nano structured thin films were grown by sol gel technique having spin coating onto glass substrates. The structural, morphological, electrical and optical properties of stacked layers films were measured by X-ray diffractrometer (XRD), field emission scanning electron microscopy (FESEM), four point probe technique and UV-Vis. spectrometer, respectively. The results of XRD showed that the titanium dioxide has brookite phase. FESEM revealed that the films consisted of nano particles with increasing size as the layers increases. EDX analysis confirmed the presence of Cu and TiO2 atoms. Four point probe results showed that the electrical average sheet resistivity for 3, 5 and 7 layers is 8x10(6), 6.5x10(6) and 1.0x10(6) ohm-cm respectively. Films have 79% transmission in the visible region of spectrum and energy band gap (E-g) for 3, 5 and 7 layers of films are 3.813, 3.822 and 3.843 eV respectively, according to UV-Vis. measurements. The present work provides an easy and low cost synthesis technique for the deposition of optoelectronic devices.