Structural and Optical Properties of Nanocrystalline Silicon Films Deposited by Plasma-Enhanced Chemical Vapor Deposition

Journal article

Peer reviewed

Atif Mossad Ali, Takao Inokuma, Yoshihiro Kurata and Seiichi Hasegawa

Japanese Journal of Applied Physics, Vol.41(Part 1, No. 1), pp.169-175

01/01/2002

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Title: Structural and Optical Properties of Nanocrystalline Silicon Films Deposited by Plasma-Enhanced Chemical Vapor Deposition
Creators - without role: Atif Mossad Ali - Kanazawa University
Takao Inokuma - Kanazawa University
Yoshihiro Kurata - Kanazawa University
Seiichi Hasegawa - Kanazawa University
Publication Details: Japanese Journal of Applied Physics, Vol.41(Part 1, No. 1), pp.169-175
Identifiers: 9922884708331
Academic Unit: King Khalid University
Language: English
Resource Type: Journal article