Abstract
Phthalocyanines are promising materials that have unique electronic and optoelectronic properties. Therefore, the fabrication of phthalocyanines doped by Gallium chloride GaClPc/n-Si heterojunction (HJ) has been done. The internal structural properties of GaClPc have been carried out using scan electron microscopy and X-rays diffraction, where it was found that the film has a nanostructure with an average particle size of 150 ± 45 nm. The capacitance-voltage of GaClPc/n-Si HJ was investigated, where the carrier concentration and built-in voltage were calculated as 6.74 × 1021 cm−3 and 0.91 V, respectively. The I–V characteristics of our investigated diode have been examined using Shockley equations. The electronic characteristics of GaClPc/n-Si HJ were studied in dark conditions and under different illumination intensities up to 100 mW/cm2. The obtained values of series and shunt resistances under dark conditions are 4.5 × 104 and 4.1 × 106 Ω, respectively. The photosensitivity of GaClPc/n-Si HJ increased up to 11.41 × 104 as the illumination intensity reached 100 mW/cm2. These results candidate the fabricated GaClPc/n-Si HJ for potential applications in photodiode devices.
•A high-quality photodiode based on GaClPc/n-Si HJ has been created.•The I–V graph showed that GaClPc/n-Si HJ is sensitive to light.•The photosensitivity of GaClPc/n-Si HJ increased up to 11.41 × 104 as the intensity reached 100 mW/cm2.