Structure Sensitivity and Photocatalytic Reactions of Semiconductors. Effect of the Last Layer Atomic Arrangement

Journal article

Peer reviewed

Jarod N. Wilson and Hicham Idriss

Journal of the American Chemical Society, Vol.124(38), pp.11284-11285

25/09/2002

PMID: 12236739

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Title: Structure Sensitivity and Photocatalytic Reactions of Semiconductors. Effect of the Last Layer Atomic Arrangement
Creators - without role: Jarod N. Wilson - University of Auckland
Hicham Idriss - University of Auckland
Publication Details: Journal of the American Chemical Society, Vol.124(38), pp.11284-11285
Publisher: American Chemical Society
Identifiers: 9944167508331
Academic Unit: King Abdullah University of Science & Technology
Language: English
Resource Type: Journal article