Abstract
Manganese (III) Phthalocyanine Chloride (MnClPc) thin films were deposited over glass substrates through the thermal evaporation technique. The structural characteristics of MnClPc films at various thicknesses have been studied using X-ray diffraction (XRD), which revealed an amorphous structure. The atomic force microscope (AFM) investigates the surface morphology of MnClPc thin films and demonstrates that films have nanostructure with a size of 58 nm for thickness 55 nm and slightly increased with increasing film thickness. Spectrophotometer analyses of MnClPc thin films obtained over the wavelength range of 300−2500 nm were used to determine the linear and nonlinear optical parameters. Results indicate that the optical energy gap of MnClPc films was slightly changed due to thickness. The parameters of the optical dispersion were considered using a single-oscillator model. Also, the nonlinear refractive index and susceptibility were determined by the concepts of linear refractive index dispersion. The optical limiting characteristics by using two different types of laser showed a considerable reduction in the laser output power by increasing the film thickness. This intensive result for MnClPc will probably implement in an industrial approach in the field of photodetectors and optoelectronic devices.