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Sub-250 nm low-threshold deep-ultraviolet AlGaN-based heterostructure laser employing HfO2/SiO2 dielectric mirrors
Journal article   Peer reviewed

Sub-250 nm low-threshold deep-ultraviolet AlGaN-based heterostructure laser employing HfO2/SiO2 dielectric mirrors

Tsung-Ting Kao, Yuh-Shiuan Liu, Md. Mahbub Satter, Xiao-Hang Li, Zachary Lochner, P. Douglas Yoder, Theeradetch Detchprohm, Russell D. Dupuis, Shyh-Chiang Shen, Jae-Hyun Ryou, …
Applied physics letters, Vol.103(21)
18/11/2013

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Physical Sciences Physics Physics, Applied Science & Technology

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