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Suitable photo-resists for two-photon polymerization using femtosecond fiber lasers
Journal article   Peer reviewed

Suitable photo-resists for two-photon polymerization using femtosecond fiber lasers

V. P. Rajamanickam, L. Ferrara, A. Toma, R. Proietti Zaccaria, G. Das, E. Di Fabrizio and C. Liberale
MICROELECTRONIC ENGINEERING, Vol.121, pp.135-138
01/06/2014

Abstract

Engineering Engineering, Electrical & Electronic Nanoscience & Nanotechnology Optics Physical Sciences Physics Physics, Applied Science & Technology Science & Technology - Other Topics Technology

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