Abstract
Composite films of TiN/Ni3N/a-Si3N4 were synthesized using the Mather-type plasma focus device with varying numbers of focus deposition shots (5, 15, and 25) at 0 degrees and 10 degrees angular positions. The composition and structural analysis of these films were analyzed by using Rutherford backscattering (RBS) and X-ray diffraction (XRD). Scanning electron microscope and atomic force microscope were used to study the surface morphology of films. XRD patterns confirm the formation of composite TiN/Ni3N/a-Si3N4 films. The crystallite size of TiN (200) plane is 11 and 22nm, respectively, at 0 degrees and 10 degrees angular positions for same 25 focus deposition shots. Impurity levels and thickness were measured using RBS. Scanning electron microscopy results show the formation of net-like structures for multiple focus shots (5, 15, and 25) at angular positions of 0 degrees and 10 degrees. The average surface roughness of the deposited films increases with increasing focus shots. The roughness of the film decreases at higher angle 10 degrees and the films obtained are smoother as compared with the films deposited at 0 degrees angular positions.