Abstract
TiO2 thin films were deposited on quartz substrate by RF-magnetron sputtering technique. The effect of varying oxygen fraction f(O-2) = (O-2/(Ar + O-2) on the surface morphology, structure, electrical and optical properties was investigated. Decreasing the oxygen fraction promotes phase transformation to the extent of isolating anatase phase with well oriented A(101) preferred crystal orientation at f(O-2) of 0.1%. The refractive index dispersion curves were utilized to estimate the single oscillator parameters. In addition, an enhancement in the electrical conductivity to 2.6 x 10(-2)omega(-1)cm(-1) at f(O-2) = 0.1% was established. This enhancement was attributed to the deficiency of oxygen as well as the formation of anatase phase.