Abstract
Atom microscopy is controlled and modified by absorption spectrum of a weak probe field using the superposition of two super-Gaussian beams. Circular and elliptical localization peaks are investigated with variance, power and direction of the super-Gaussian beams. The shape of localization peaks depends upon the variance of the standard deviation and power of the super-Gaussian beams. Depth elliptical localization peaks are also controlled and modified with direction and variance of super-Gaussian beams. The modified results show significance in advanced nano-lithography and high technological applications.