Sign in
UHV CAFM characterization of high-k dielectrics: Effect of the technique resolution on the pre- and post-breakdown electrical measurements
Journal article   Peer reviewed

UHV CAFM characterization of high-k dielectrics: Effect of the technique resolution on the pre- and post-breakdown electrical measurements

M. Lanza, M. Porti, M. Nafria, X. Aymerich, E. Whittaker and B. Hamilton
Microelectronics and reliability, Vol.50(9-11), pp.1312-1315
01/09/2010

Abstract

Engineering Engineering, Electrical & Electronic Nanoscience & Nanotechnology Physical Sciences Physics Physics, Applied Science & Technology Science & Technology - Other Topics Technology

Metrics

1 Record Views

Details