Abstract
In this work, amorphous InSe thin films coated with 30-160-nm-thick SiO 2 are used as an active material to fabricate multifunctional devices. The {n} -InSe/ {p} -SiO 2 layers that are deposited onto ytterbium substrates are optically and electrically characterized. It was observed that the coating of SiO 2 nanosheets onto the surface of InSe enhances the light absorbability in the near-infrared range without remarkable altering of the bandgap. Significant increase in the steady-state photocurrent values accompanied by faster photocurrent responses resulted from the coating of SiO 2 nanosheets. Electrically, while the Yb/InSe/Au channels display tunneling Schottky barrier characteristics, the Yb/InSe/SiO 2 /Au channels show pn junction features. Both channels displayed metal-oxide-semiconductors (MOS) capacitance-voltage characteristics. In addition, the analyses of the current-voltage characteristics have shown that the currents in the Yb/InSe/Au and Yb/InSe/SiO 2 (30 nm)/Au channel are dominated by electric field-assisted thermionic emission (tunneling) of charge carriers through barriers of widths of 18/14 and 30/16 nm under reverse-/forward-biasing conditions, respectively. Further increase in the oxide layer thickness lowered the barrier height of the devices. On the other hand, when an ac signal of low amplitude is imposed through the device channels, the conductance, capacitance, and reflection coefficient spectra displayed bandstop filter characteristics near 1.6 GHz. The microwave cutoff frequency spectra show a remarkable increase in the cutoff frequency values as a result of the coating of InSe with SiO 2 nanosheets. The features of the device assure its applicability as rectifying diodes, fast photosensors, MOS capacitors, and microwave bandstop filters.