Abstract
We report that a covalent compound, boron phosphide (BP), can function as a highly stable and metal-free photocatalyst to produce hydrogen from water in the presence of sacrificial agents under visible light irradiation, even at extreme conditions such as strong acid and alkali. The BP photocatalyst is an n-type semiconductor and possesses highly chemical stability, which is resistant to corrosion by hot concentrated mineral acids (concentrated HCl, H2SO4, HNO3, and aqua regia) and aqueous alkali solution, offering new opportunities in the field of artificial photosynthesis.
Boron phosphide can function as a metal-free and high-stable photocatalyst to produce hydrogen from water in the presence of sacrificial agents under visible light irradiation. The as-prepared BP is a highly stable n-type semiconductor material, which is resistant to corrosion by hot concentrated mineral acids and aqueous alkali solution. [Display omitted]
•The n-type BP can function as a highly stable and metal-free photocatalyst for H2 evolution under visible light.•The metal-free BP is resistant to corrosion by hot concentrated mineral acids and aqueous alkali solution.•The metal-free BP can also sustainably catalyse hydrogen evolution in the strong acid and alkali reaction solutions.