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Influence of the vacuum interface on the charge distribution in V2O3 thin films
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Influence of the vacuum interface on the charge distribution in V2O3 thin films

Udo Schwingenschloegl, Raymond Fresard and Volker Eyert
arXiv.org, Vol.11, p.093034
Cornell University Library, arXiv.org
07/09/2009

Abstract

Charge distribution Density functional theory Dependence Electronic structure Insulators Metal-insulator transition Spherical waves Surface layers Thickness Thin films Vanadium oxides
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https://doi.org/10.1088/1367-2630/11/9/093034View
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