Tuning the chemistry in plasma-based CO2 and CH4 reforming processes using additives and scavengers

Presentation

American Chemical Society (ACS)

31/03/2019

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Title: Tuning the chemistry in plasma-based CO2 and CH4 reforming processes using additives and scavengers
Creators - without role: Ramses Snoeckx
Min Suk Cha
Publisher: American Chemical Society (ACS)
Identifiers: 9945100508331
Academic Unit: King Abdullah University of Science & Technology
Language: English
Resource Type: Presentation